Citation link:
Authors:
Andreev, Svetozar Krastev; Georgieva, Adriana Kirilova; Todorov, Svetlin Stefanov
Title:
Three-dimensional microfabrication of high-aspect-ratio structures using dry negative photoresist
Date of Issue:
2006
Is Part of:
Proceedings of the Technical University – Sofia, 56(1), 2006, pp. 136-141
Publisher:
TU - Sofia
Identifiers:
1311-0829 [issn]
Type:
Article
Language:
eng
Subject:
LIGA; microcontacts; dry photoresist; micromechanics; photolithography
Abstract:
The development of anisotropic, high-aspect-ratio micromachining processes has provided opportunity for the extension of silicon microfabrication capability well into the third dimension. For some applications, however, truly 3D structures are desired, especially those that possess arbitrary surface height profiles, i.e., surfaces with multiple height levels and/or nonplanar profiles. The present paper presents results from the fabrication of 3D microcontact structures using LIGA process. It is known that this process is used in micromechanics for constructing 3D structures for a long time using roentgen as well as UV photolithography. This material suggests technological order and realization of 3D microcontacts using many-stages photolithography of dry photoresist.
Description:
Reviewer prof. Anna Andonova. - Figuras. - References, pp. 141
