Boiadjiev, Stefan Ivanov; Marinov, Boris Marinov; Dobrikov, Georgi Hristov; Yordanov, Rumen Stoyanov; Minkova-Rassovska, Milka Markova
Ionization chamber based on RF sputtered ITO thin films
Proceedings of the Technical University – Sofia, 56(1), 2006, pp. 126-129
TU - Sofia
ionization chamber; ITO; RF sputtering; thin films
The present work presents a new type ionization chambers for x-ray dose meters, based on indium-tin oxide (ITO) thin films. ITO attract our attention as promising material with various applications, here in our study as a transparent conducting coating, but also for transparent conductive electrodes in displays, solar cells and many other applications, where transparent electrodes are needed. The films microstructure has been studied by TEM and SAED using TEM-400, Philips transmission electron microscope. VIS – UV spectrophotometry analysis showed the high visible transmittance of the RF sputtered ITO films. Тhe dependence of voltage signal from the ionization dose has also been studied. The main goal of the research activities is developing new technological processes leading to low-cost, highly effective optical coatings for application in ionization chambers.
Reviewer prof. Anna Andonova. - Pictures, diagr. - References, pp. 129