Andreev, Svetozar Krastev; Georgieva, Adriana Kirilova; Todorov, Svetlin Stefanov
Three-dimensional microfabrication of high-aspect-ratio structures using dry negative photoresist
Proceedings of the Technical University – Sofia, 56(1), 2006, pp. 136-141
TU - Sofia
LIGA; microcontacts; dry photoresist; micromechanics; photolithography
The development of anisotropic, high-aspect-ratio micromachining processes has provided opportunity for the extension of silicon microfabrication capability well into the third dimension. For some applications, however, truly 3D structures are desired, especially those that possess arbitrary surface height profiles, i.e., surfaces with multiple height levels and/or nonplanar profiles. The present paper presents results from the fabrication of 3D microcontact structures using LIGA process. It is known that this process is used in micromechanics for constructing 3D structures for a long time using roentgen as well as UV photolithography. This material suggests technological order and realization of 3D microcontacts using many-stages photolithography of dry photoresist.
Reviewer prof. Anna Andonova. - Figuras. - References, pp. 141